Plasma ion sources CVD plasma aspects, limits and possibilities

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Abstract

The process of plasma deposition and surface modification depends on the nature and intensity of the particle and energy fluxes incident on the substrate. By way of examples of plasma beam deposition possible mechanisms will be shown, which influence the growth of good quality layers with high growth rates. The possible contributions of ion, radical and energy fluxes will be summarised. The possibility of replacing the ion (and radical) fluxes by ion (and radical) beams will be discussed. At hand is a short summary of available ion beams and a discussion of restraints and necessary conditions to the source plasma for ion beam formation possibilities to achieve high brightness sources with a large efficiency will be indicated.
Original languageEnglish
Pages (from-to)136-144
JournalNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume139
Issue number1-4
DOIs
Publication statusPublished - 1998

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