Plasma internal profile control using IDA-PBC: application to TCV

N.M.T. Vu, R. Nouailletas, E. Maljaars, F. Felici, O. Sauter

Research output: Contribution to journalArticleAcademicpeer-review

13 Citations (Scopus)


In this paper, new results of plasma ι-profile and β control on TCV, using total plasma current I p , and ECCD (Electron Cyclotron heating and Current Drive) heating source have been discussed. The control model is governed by the resistive diffusion equation coupled with the thermal transport equation, written in PCH (Port-Controlled Hamiltonian) formulation. The IDA-PBC (Interconnection and Damping Assignment - Passivity based Control) controller is developed and tested on simulation as well as on TCV real plant. Two test scenarios are considered: ι control only, and ι and β control. The spatial distributions of ECCD profiles are pre-defined and only input powers are used for control design. Thus, a stationary control is defined in order to consider all non-linearity and actuator constraint, and a linear feedback IDA-PBC will ensure the convergence speed and the robustness of the closed-loop system. The obtained results are encouraging towards using routinely such plasma advanced control algorithm in a near future.

Original languageEnglish
Pages (from-to)624-627
Number of pages4
JournalFusion Engineering and Design
Early online date9 Mar 2017
Publication statusPublished - Nov 2017


  • IDA-PBC control
  • Plasma current profile control
  • Port-Controlled Hamiltonian systems
  • Tokamak plasma control


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