Plasma-enhanced atmospheric-pressure spatial ALD of Al2O3 and ZrO2

Y. Creyghton, A. Illiberi, A. Mione, W. Van Boekel, N. Debernardi, M. Seitz, F. Van Den Bruele, P. Poodt, F. Roozeboom

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

13 Citations (Scopus)
8 Downloads (Pure)


Non-thermal plasma sources are known to lower the operation temperatures and widen the process windows in thermal ALD of thin-film materials. In spatial ALD, novel plasma sources with exceptional dimensional and chemical stability are required to provide the flow geometries optimized for efficient transport and use of radicals (O, N, H, OH, NH, etc.). This paper describes our preliminary efforts to provide and examine the required linear scalable plasma sources in spatial ALD reactors. The effectiveness of close-proximity direct and remote plasma sources was demonstrated for thin dielectric films of Al2O3 and ZrO2 deposited at temperatures ranging from 20 to 100 °C. Both direct and remote SDBD-type (Surface Dielectric Barrier Discharge) plasma sources were applied using conventional metal precursors and O2/N2 plasma. The remote plasma designs proved advantageous in avoiding electrical source-substrate interactions which often result in layer or substrate damage caused by filamentary plasma discharges impacting the substrate.

Original languageEnglish
Title of host publicationAtomic Layer Deposition Applications 12
PublisherElectrochemical Society, Inc.
Number of pages9
ISBN (Electronic)9781607685395
Publication statusPublished - 6 Oct 2016
EventSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: 2 Oct 20167 Oct 2016

Publication series

NameECS Transactions
ISSN (Electronic)1938-5862


ConferenceSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
Country/TerritoryUnited States
Internet address


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