Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma

A. Sarkar; S.E. Potts; S.A. Rushworth; F. Roozeboom; M.C.M. Sanden, van de; W.M.M. Kessels

doi:10.1149/1.3485274

Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma

A. Sarkar, S.E. Potts, S.A. Rushworth, F. Roozeboom, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

9 Citations (Scopus)

2 Downloads (Pure)

Abstract

Titanium oxide thin films of both amorphous and anatase morphologies have been deposited using remote plasma ALD over a wide temperature range (100-350 °C), using a novel heteroleptic alkylamido precursor Ti(CpMe)(NMe2)3. A high growth per cycle (GPC) of 0.07-0.08 nm (50 % higher than the GPC obtained with most other organometallic precursors). Films obtained were stoichiometric and of high compositional purity.

Original language	English
Title of host publication	Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA
Pages	385-393
DOIs	https://doi.org/10.1149/1.3485274
Publication status	Published - 2010
Event	218th Electrochemical Society Meeting (ECS 2010) - Las Vegas, United States Duration: 10 Oct 2010 → 15 Oct 2010 Conference number: 218 https://www.electrochem.org/218

Publication series

Name	ECS Transactions
Volume	33
ISSN (Print)	1938-6737

Conference

Conference	218th Electrochemical Society Meeting (ECS 2010)
Abbreviated title	ECS 2010
Country/Territory	United States
City	Las Vegas
Period	10/10/10 → 15/10/10
Internet address	https://www.electrochem.org/218

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Sarkar, A., Potts, S. E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M., & Kessels, W. M. M. (2010). Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma. In Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA (pp. 385-393). (ECS Transactions; Vol. 33). https://doi.org/10.1149/1.3485274

@inproceedings{f23855e61a9541ec9d85668459898e12,

title = "Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma",

abstract = "Titanium oxide thin films of both amorphous and anatase morphologies have been deposited using remote plasma ALD over a wide temperature range (100-350 °C), using a novel heteroleptic alkylamido precursor Ti(CpMe)(NMe2)3. A high growth per cycle (GPC) of 0.07-0.08 nm (50 % higher than the GPC obtained with most other organometallic precursors). Films obtained were stoichiometric and of high compositional purity.",

author = "A. Sarkar and S.E. Potts and S.A. Rushworth and F. Roozeboom and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2010",

doi = "10.1149/1.3485274",

language = "English",

series = "ECS Transactions",

pages = "385--393",

booktitle = "Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA",

note = "218th Electrochemical Society Meeting (ECS 2010), ECS 2010 ; Conference date: 10-10-2010 Through 15-10-2010",

url = "https://www.electrochem.org/218",

}

Sarkar, A, Potts, SE, Rushworth, SA, Roozeboom, F, Sanden, van de, MCM & Kessels, WMM 2010, Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma. in Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA. ECS Transactions, vol. 33, pp. 385-393, 218th Electrochemical Society Meeting (ECS 2010), Las Vegas, Nevada, United States, 10/10/10. https://doi.org/10.1149/1.3485274

Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma. / Sarkar, A.; Potts, S.E.; Rushworth, S.A. et al.
Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA. 2010. p. 385-393 (ECS Transactions; Vol. 33).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma

AU - Sarkar, A.

AU - Potts, S.E.

AU - Rushworth, S.A.

AU - Roozeboom, F.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

N1 - Conference code: 218

PY - 2010

Y1 - 2010

N2 - Titanium oxide thin films of both amorphous and anatase morphologies have been deposited using remote plasma ALD over a wide temperature range (100-350 °C), using a novel heteroleptic alkylamido precursor Ti(CpMe)(NMe2)3. A high growth per cycle (GPC) of 0.07-0.08 nm (50 % higher than the GPC obtained with most other organometallic precursors). Films obtained were stoichiometric and of high compositional purity.

AB - Titanium oxide thin films of both amorphous and anatase morphologies have been deposited using remote plasma ALD over a wide temperature range (100-350 °C), using a novel heteroleptic alkylamido precursor Ti(CpMe)(NMe2)3. A high growth per cycle (GPC) of 0.07-0.08 nm (50 % higher than the GPC obtained with most other organometallic precursors). Films obtained were stoichiometric and of high compositional purity.

U2 - 10.1149/1.3485274

DO - 10.1149/1.3485274

M3 - Conference contribution

T3 - ECS Transactions

SP - 385

EP - 393

BT - Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA

T2 - 218th Electrochemical Society Meeting (ECS 2010)

Y2 - 10 October 2010 through 15 October 2010

ER -

Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma

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