Plasma chemistry of fluorocarbon RF discharges used for dry etching

M. Haverlag

Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)

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Original language	English
Qualification	Doctor of Philosophy
Awarding Institution	Applied Physics and Science Education
Supervisors/Advisors	de Hoog, F.J., Promotor Kono, A., Promotor, External person Kroesen, Gerrit M.W., Copromotor
Award date	10 Sept 1991
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
DOIs	https://doi.org/10.6100/IR356670
Publication status	Published - 1991

Proefschrift.

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@phdthesis{f0011ce53c71455cb01a3bb3d17c1f65,

title = "Plasma chemistry of fluorocarbon RF discharges used for dry etching",

author = "M. Haverlag",

note = "Proefschrift.",

year = "1991",

doi = "10.6100/IR356670",

language = "English",

publisher = "Technische Universiteit Eindhoven",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}