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Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C:H
M.C.M. Van De Sanden, M.F.A.M. Van Hest, A. De Graaf, A.H.M. Smets, K.G.Y. Letourneur, M.G.H. Boogaarts, D.C. Schram
Research output: Contribution to journal › Article › Academic › peer-review
26
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(Scopus)