Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C:H

M.C.M. Van De Sanden, M.F.A.M. Van Hest, A. De Graaf, A.H.M. Smets, K.G.Y. Letourneur, M.G.H. Boogaarts, D.C. Schram

Research output: Contribution to journalArticleAcademicpeer-review

26 Citations (Scopus)

Abstract

Mass spectrometric measurements in combination with Langmuir probe measurements reveal that the plasma chemistry of an expanding Ar/C2H2 is dominated by argon-ion-induced dissociation of the precursor gas. Under high arc current conditions complete depletion of acetylene is observed, indicating an efficient consumption of the injected acetylene. A clear correlation between the ion fluence emanating from the arc determined from modeling the mass spectrometry results and Langmuir probe measurements is observed. First measurements by means of cavity ring down and optical emission spectroscopy of the products of the dissociation of acetylene indicate that the dominant dissociation channel is C2H and H.

Original languageEnglish
Pages (from-to)677-681
Number of pages5
JournalDiamond and Related Materials
Volume8
Issue number2-5
DOIs
Publication statusPublished - 1 Mar 1999

Keywords

  • A-C:H
  • Plasma chemistry
  • Plasma deposition

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