Plasma chemistry during deposition of a-C:H

J. Benedikt; K.G.Y. Letourneur; M. Wisse; D.C. Schram; M.C.M. Sanden, van de

doi:10.1016/S0925-9635(01)00534-9

Plasma chemistry during deposition of a-C:H

J. Benedikt, K.G.Y. Letourneur, M. Wisse, D.C. Schram, M.C.M. Sanden, van de

Plasma & Materials Processing

Research output: Contribution to journal › Article › Academic › peer-review

35 Citations (Scopus)

1 Downloads (Pure)

Abstract

The different dissociation products (C, C/sub 2/, CH and C/sub 2/H) from C/sub 2/H/sub 2/ dissociation in a remote Ar/C/sub 2/H/sub 2/ plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C/sub 2/ and CH were spectrally identified, in the region where C/sub 2/H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it

Original language	English
Pages (from-to)	989-993
Journal	Diamond and Related Materials
Volume	11
Issue number	3-6
DOIs	https://doi.org/10.1016/S0925-9635(01)00534-9
Publication status	Published - 2002

Access to Document

10.1016/S0925-9635(01)00534-9

Fingerprint Dive into the research topics of 'Plasma chemistry during deposition of a-C:H'. Together they form a unique fingerprint.

Cite this

@article{f317135e9c4a468e92dc64717b71eb8f,

title = "Plasma chemistry during deposition of a-C:H",

abstract = "The different dissociation products (C, C/sub 2/, CH and C/sub 2/H) from C/sub 2/H/sub 2/ dissociation in a remote Ar/C/sub 2/H/sub 2/ plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C/sub 2/ and CH were spectrally identified, in the region where C/sub 2/H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it",

author = "J. Benedikt and K.G.Y. Letourneur and M. Wisse and D.C. Schram and {Sanden, van de}, M.C.M.",

year = "2002",

doi = "10.1016/S0925-9635(01)00534-9",

language = "English",

volume = "11",

pages = "989--993",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier",

number = "3-6",

}

TY - JOUR

T1 - Plasma chemistry during deposition of a-C:H

AU - Benedikt, J.

AU - Letourneur, K.G.Y.

AU - Wisse, M.

AU - Schram, D.C.

AU - Sanden, van de, M.C.M.

PY - 2002

Y1 - 2002

N2 - The different dissociation products (C, C/sub 2/, CH and C/sub 2/H) from C/sub 2/H/sub 2/ dissociation in a remote Ar/C/sub 2/H/sub 2/ plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C/sub 2/ and CH were spectrally identified, in the region where C/sub 2/H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it

AB - The different dissociation products (C, C/sub 2/, CH and C/sub 2/H) from C/sub 2/H/sub 2/ dissociation in a remote Ar/C/sub 2/H/sub 2/ plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C/sub 2/ and CH were spectrally identified, in the region where C/sub 2/H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it

U2 - 10.1016/S0925-9635(01)00534-9

DO - 10.1016/S0925-9635(01)00534-9

M3 - Article

VL - 11

SP - 989

EP - 993

JO - Diamond and Related Materials

JF - Diamond and Related Materials

SN - 0925-9635

IS - 3-6

ER -