Plasma chemistry during deposition of a-C:H

J. Benedikt, K.G.Y. Letourneur, M. Wisse, D.C. Schram, M.C.M. Sanden, van de

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The different dissociation products (C, C/sub 2/, CH and C/sub 2/H) from C/sub 2/H/sub 2/ dissociation in a remote Ar/C/sub 2/H/sub 2/ plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C/sub 2/ and CH were spectrally identified, in the region where C/sub 2/H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it
Original languageEnglish
Pages (from-to)989-993
JournalDiamond and Related Materials
Issue number3-6
Publication statusPublished - 2002


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