Plasma chemistry during deposition of a-C:H

J. Benedikt, K.G.Y. Letourneur, M. Wisse, D.C. Schram, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

35 Citations (Scopus)
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Abstract

The different dissociation products (C, C/sub 2/, CH and C/sub 2/H) from C/sub 2/H/sub 2/ dissociation in a remote Ar/C/sub 2/H/sub 2/ plasma were measured using Cavity Ring Down Spectroscopy (CRDS). Whereas the radicals C, C/sub 2/ and CH were spectrally identified, in the region where C/sub 2/H absorption is usually assigned (260-290 nm) only broadband absorption was observed. Suggestions are given on how to explain the broadband absorption, but as yet no clear identification has been made and no species assigned to it
Original languageEnglish
Pages (from-to)989-993
JournalDiamond and Related Materials
Volume11
Issue number3-6
DOIs
Publication statusPublished - 2002

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