Plasma-assisted atomic layer deposition of SrTiO3 : stoichiometry and crystallization study by spectroscopic ellipsometry

V. Longo, N. Leick, F. Roozeboom, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

7 Citations (Scopus)
1 Downloads (Pure)


Strontium titanate (SrTiO3, STO) films were deposited by plasma-assisted ALD using cyclopentadienyl-based Sr and Ti precursors with O2 plasma as the oxidizing agent. As determined from Rutherford backscattering spectroscopy (RBS), [Sr]/[Ti] ratios ranging from 0.73 to 2.13 were achieved for 30-40 nm thick films by tuning the [SrO]/[TiO2] ALD cycle ratio. Films deposited at 250 °C were amorphous and required post-deposition annealing to crystallize into the ultrahigh-k perovskite structure. The crystallization temperature strongly depended on the film composition as observed by X-ray diffraction (XRD) measurements after rapid thermal annealing (RTA). Using RBS and XRD data as a combined-cross reference, it was shown that the film stoichiometry and the crystallinity can be probed directly by spectroscopic ellipsometry (SE).
Original languageEnglish
Title of host publicationProceedings of the 220th ECS meeting and Electrochemical Energy Summit, October 9-14, 2011, Boston, Massachusetts
EditorsA. Gendt, de, A. Londergan, S. Bent, O. Straten, van der, A. Delabie, F. Roozeboom
Place of PublicationPennington
Publication statusPublished - 2011
Eventconference; Atomic Layer Deposition Applications 7 -
Duration: 1 Jan 2011 → …

Publication series

NameECS Transactions
ISSN (Print)1938-6737


Conferenceconference; Atomic Layer Deposition Applications 7
Period1/01/11 → …
OtherAtomic Layer Deposition Applications 7


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