Plasma-assisted atomic layer deposition of conductive HfNx: on the role of plasma chemistry and ions in tailoring film properties

Saurabh Karwal

Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)

193 Downloads (Pure)

Original language	English
Qualification	Doctor of Philosophy
Awarding Institution	Applied Physics and Science Education
Supervisors/Advisors	Creatore, M. (Adriana), Promotor Kessels, W.M.M. (Erwin), Promotor Verheijen, Marcel A., Copromotor
Award date	6 Feb 2020
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
Print ISBNs	978-90-386-4946-7
Publication status	Published - 6 Feb 2020

Proefschrift.

Promotion : time and place

@phdthesis{3fcf913415fd40338e3a700970195c11,

title = "Plasma-assisted atomic layer deposition of conductive HfNx: on the role of plasma chemistry and ions in tailoring film properties",

author = "Saurabh Karwal",

note = "Proefschrift.",

year = "2020",

month = feb,

day = "6",

language = "English",

isbn = "978-90-386-4946-7",

publisher = "Technische Universiteit Eindhoven",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}