Plasma-assisted atomic layer deposition of conductive HfNx: on the role of plasma chemistry and ions in tailoring film properties

Saurabh Karwal

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

84 Downloads (Pure)
Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Applied Physics and Science Education
Supervisors/Advisors
  • Creatore, M. (Adriana), Promotor
  • Kessels, W.M.M. (Erwin), Promotor
  • Verheijen, Marcel A., Copromotor
Award date6 Feb 2020
Place of PublicationEindhoven
Publisher
Print ISBNs978-90-386-4946-7
Publication statusPublished - 6 Feb 2020

Bibliographical note

Proefschrift.

Promotion : time and place

  • 16.00h, Atlas, room 0.710

Cite this