Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Research output: Contribution to journalArticleAcademicpeer-review

261 Citations (Scopus)
603 Downloads (Pure)


Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted at. layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temp. and a good WVTR of 5 * 10-3 g m-2 day-1 (WVTRPEN=0.5 g m-2 day-1) was measured for a 20 nm thick Al2O3 film deposited at room temp. using short purging times. Such ultrathin, low-temp. deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. [on SciFinder (R)]
Original languageEnglish
Article number081915
Pages (from-to)081915-1/3
Number of pages3
JournalApplied Physics Letters
Issue number8
Publication statusPublished - 2006


Dive into the research topics of 'Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers'. Together they form a unique fingerprint.

Cite this