Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

E. Langereis; M. Creatore; S.B.S. Heil; M.C.M. Sanden, van de; W.M.M. Kessels

doi:10.1063/1.2338776

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

E. Langereis, M. Creatore, S.B.S. Heil, M.C.M. Sanden, van de, W.M.M. Kessels

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Abstract

Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted at. layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temp. and a good WVTR of 5 * 10-3 g m-2 day-1 (WVTRPEN=0.5 g m-2 day-1) was measured for a 20 nm thick Al2O3 film deposited at room temp. using short purging times. Such ultrathin, low-temp. deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. [on SciFinder (R)]

Original language	English
Article number	081915
Pages (from-to)	081915-1/3
Number of pages	3
Journal	Applied Physics Letters
Volume	89
Issue number	8
DOIs	https://doi.org/10.1063/1.2338776
Publication status	Published - 2006

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title = "Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers",

abstract = "Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted at. layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temp. and a good WVTR of 5 * 10-3 g m-2 day-1 (WVTRPEN=0.5 g m-2 day-1) was measured for a 20 nm thick Al2O3 film deposited at room temp. using short purging times. Such ultrathin, low-temp. deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. [on SciFinder (R)]",

author = "E. Langereis and M. Creatore and S.B.S. Heil and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2006",

doi = "10.1063/1.2338776",

language = "English",

volume = "89",

pages = "081915--1/3",

journal = "Applied Physics Letters",

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publisher = "American Institute of Physics",

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T1 - Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

AU - Langereis, E.

AU - Creatore, M.

AU - Heil, S.B.S.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2006

Y1 - 2006

N2 - Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted at. layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temp. and a good WVTR of 5 * 10-3 g m-2 day-1 (WVTRPEN=0.5 g m-2 day-1) was measured for a 20 nm thick Al2O3 film deposited at room temp. using short purging times. Such ultrathin, low-temp. deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. [on SciFinder (R)]

AB - Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted at. layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temp. and a good WVTR of 5 * 10-3 g m-2 day-1 (WVTRPEN=0.5 g m-2 day-1) was measured for a 20 nm thick Al2O3 film deposited at room temp. using short purging times. Such ultrathin, low-temp. deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. [on SciFinder (R)]

U2 - 10.1063/1.2338776

DO - 10.1063/1.2338776

M3 - Article

SN - 0003-6951

VL - 89

SP - 081915-1/3

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

M1 - 081915

ER -

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

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