Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

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Abstract

Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted at. layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temp. and a good WVTR of 5 * 10-3 g m-2 day-1 (WVTRPEN=0.5 g m-2 day-1) was measured for a 20 nm thick Al2O3 film deposited at room temp. using short purging times. Such ultrathin, low-temp. deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications. [on SciFinder (R)]
Original languageEnglish
Article number081915
Pages (from-to)081915-1/3
Number of pages3
JournalApplied Physics Letters
Volume89
Issue number8
DOIs
Publication statusPublished - 2006

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