Plasma-assisted atomic layer deposition of AI2O3 on polymer for moisture diffusion barrier applications

Research output: Contribution to conferencePoster

Abstract

No abstract
Original languageEnglish
PagesO 11-
Publication statusPublished - 2006
Event18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands - Lunteren, Netherlands
Duration: 22 Mar 200623 Mar 2006

Conference

Conference18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands
CountryNetherlands
CityLunteren
Period22/03/0623/03/06

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Bibliographical note

18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

Cite this

Langereis, E., Heil, M., Creatore, M., Sanden, van de, M. C. M., & Kessels, W. M. M. (2006). Plasma-assisted atomic layer deposition of AI2O3 on polymer for moisture diffusion barrier applications. O 11-. Poster session presented at 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands, Lunteren, Netherlands.