Abstract
The usage of plasma as a reactant in atomic layer deposition processes started out as a niche process but in the meantime had its breakthrough in high-volume manufacturing in nano-electronics.
Understanding the processes in plasma ALD is challenging but the knowledge in the Netherlands on plasma science, surface science and the ALD end-applications are a perfect foundation for a globally leading position in this field.
Understanding the processes in plasma ALD is challenging but the knowledge in the Netherlands on plasma science, surface science and the ALD end-applications are a perfect foundation for a globally leading position in this field.
| Original language | English |
|---|---|
| Pages (from-to) | 10-13 |
| Journal | Nevac Blad |
| Volume | 58 |
| Issue number | 2 |
| Publication status | Published - 2 Jun 2020 |