Plasma-assisted Atomic Layer Deposition: High-volume manufacturing and new opportunities in research

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Abstract

The usage of plasma as a reactant in atomic layer deposition processes started out as a niche process but in the meantime had its breakthrough in high-volume manufacturing in nano-electronics.
Understanding the processes in plasma ALD is challenging but the knowledge in the Netherlands on plasma science, surface science and the ALD end-applications are a perfect foundation for a globally leading position in this field.
Original languageEnglish
Pages (from-to)10-13
JournalNevac Blad
Volume58
Issue number2
Publication statusPublished - 2 Jun 2020

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