Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure

Saurabh Karwal, Marcel A. Verheijen, Karsten Arts, Tahsin Faraz, Wilhelmus M. M. Kessels, Mariadriana Creatore (Corresponding author)

Research output: Contribution to journal › Article › Academic › peer-review

16 Citations (Scopus)
114 Downloads (Pure)

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Material Science