Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Presentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings
Pages	PS-ThM4-
Publication status	Published - 1999
Event	46th International Symposium American Vacuum Society - Seattle, United States Duration: 25 Oct 1999 → 29 Oct 1999

Conference	46th International Symposium American Vacuum Society
Abbreviated title	AVS 46
Country/Territory	United States
City	Seattle
Period	25/10/99 → 29/10/99

Cite this

Kessels, W. M. M., Sanden, van de, M. C. M., Smets, A. H. M., Korevaar, B. A., & Schram, D. C. (1999). Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality. In Presentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings (pp. PS-ThM4-)

@inproceedings{c584fdfb9bfc4279ac723234e0c26688,

title = "Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality",

author = "W.M.M. Kessels and {Sanden, van de}, M.C.M. and A.H.M. Smets and B.A. Korevaar and D.C. Schram",

year = "1999",

language = "English",

pages = "PS--ThM4--",

booktitle = "Presentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings",

note = "46th International Symposium American Vacuum Society, AVS 46 ; Conference date: 25-10-1999 Through 29-10-1999",

}

Kessels, WMM , Sanden, van de, MCM, Smets, AHM, Korevaar, BA & Schram, DC 1999, Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality. in Presentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings. pp. PS-ThM4-, 46th International Symposium American Vacuum Society, Seattle, United States, 25/10/99.

Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality. / Kessels, W.M.M.; Sanden, van de, M.C.M.; Smets, A.H.M. et al.
Presentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings. 1999. p. PS-ThM4-.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

AU - Smets, A.H.M.

AU - Korevaar, B.A.

AU - Schram, D.C.

PY - 1999

Y1 - 1999

M3 - Conference contribution

SP - PS-ThM4-

BT - Presentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings

T2 - 46th International Symposium American Vacuum Society

Y2 - 25 October 1999 through 29 October 1999

ER -