Plasma and surface chemistry in a remote silane plasma studied by various diagnostics and related to a-Si-H film quality

W.M.M. Kessels, M.C.M. Sanden, van de, A.H.M. Smets, B.A. Korevaar, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationPresentation at the AVS, American Vacuum Society : 46th international symposium, Seattle, October 25-29, 1999 : virtual proceedings
Publication statusPublished - 1999
Event46th International Symposium American Vacuum Society - Seattle, United States
Duration: 25 Oct 199929 Oct 1999


Conference46th International Symposium American Vacuum Society
Abbreviated titleAVS 46
Country/TerritoryUnited States

Cite this