Planar, monolithically integrated coil

F. Roozeboom (Inventor), D. Reefman (Inventor), J.H. Klootwijk (Inventor), L.F. Tiemeijer (Inventor), J. Ruigrok (Inventor)

Research output: PatentPatent publication

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Abstract

The present invention provides a means to integrate planar coils on silicon, while providing a high inductance. This high inductance is achieved through a special back- and front sided shielding of a material. In many applications, high-value inductors are a necessity. In particular, this holds for applications in power management. In these applications, the inductors are at least 5 of the order of 1 [mu]H, and must have an equivalent series resistance of less than 0.1[Omega]. For this reason, those inductors are always bulky components, of a typical size of 221 mm 3, which make a fully integrated solution impossible. On the other hand, integrated inductors, which can monolithically be integrated, do exist. However, these inductors suffer either from low inductance values, or 10 very-high DC resistance values.
Original languageEnglish
Patent numberUS8395472
Publication statusPublished - 12 Mar 2013
Externally publishedYes

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