PIXE monitoring of diffusion during photo-polymerization

C.M. Leewis; D.P.L. Simons; A.M. Jong, de; D.J. Broer; M.J.A. Voigt, de

doi:10.1016/S0168-583X(99)00682-5

PIXE monitoring of diffusion during photo-polymerization

C.M. Leewis
, D.P.L. Simons
, A.M. Jong, de
, D.J. Broer
, M.J.A. Voigt, de

Research output: Contribution to journal › Article › Academic › peer-review

11 Citations (Scopus)

2 Downloads (Pure)

Abstract

Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.

Original language	English
Pages (from-to)	651-655
Number of pages	5
Journal	Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Volume	161-163
DOIs	https://doi.org/10.1016/S0168-583X(99)00682-5
Publication status	Published - 2000

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title = "PIXE monitoring of diffusion during photo-polymerization",

abstract = "Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.",

author = "C.M. Leewis and D.P.L. Simons and \{Jong, de\}, A.M. and D.J. Broer and \{Voigt, de\}, M.J.A.",

year = "2000",

doi = "10.1016/S0168-583X(99)00682-5",

language = "English",

volume = "161-163",

pages = "651--655",

journal = "Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms",

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TY - JOUR

T1 - PIXE monitoring of diffusion during photo-polymerization

AU - Leewis, C.M.

AU - Simons, D.P.L.

AU - Jong, de, A.M.

AU - Broer, D.J.

AU - Voigt, de, M.J.A.

PY - 2000

Y1 - 2000

N2 - Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.

AB - Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.

U2 - 10.1016/S0168-583X(99)00682-5

DO - 10.1016/S0168-583X(99)00682-5

M3 - Article

SN - 0168-583X

VL - 161-163

SP - 651

EP - 655

JO - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms

ER -

PIXE monitoring of diffusion during photo-polymerization

Abstract

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