PIXE monitoring of diffusion during photo-polymerization

C.M. Leewis, D.P.L. Simons, A.M. Jong, de, D.J. Broer, M.J.A. Voigt, de

Research output: Contribution to journalArticleAcademicpeer-review

11 Citations (Scopus)
1 Downloads (Pure)


Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.
Original languageEnglish
Pages (from-to)651-655
Number of pages5
JournalNuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
Publication statusPublished - 2000


Dive into the research topics of 'PIXE monitoring of diffusion during photo-polymerization'. Together they form a unique fingerprint.

Cite this