TY - JOUR
T1 - PIXE monitoring of diffusion during photo-polymerization
AU - Leewis, C.M.
AU - Simons, D.P.L.
AU - Jong, de, A.M.
AU - Broer, D.J.
AU - Voigt, de, M.J.A.
PY - 2000
Y1 - 2000
N2 - Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.
AB - Patterned UV photo-polymerization is used to prepare polymer gratings from a mixture of mono- and di-functional acrylate monomers. The difference in reactivity and mobility of these two monomers induces a concentration gradient during the photo-polymerization process. Uniform illumination afterwards fixes the grating. Monomers with different easily detectable elements, e.g., Cl, Br, Si, F, enable the observation of lateral variations of concentration in these gratings with PIXE and PIGE using a scanning ion probe of 3 MeV protons. In addition, backscattering spectrometry is applied to correct for lateral thickness variations.
U2 - 10.1016/S0168-583X(99)00682-5
DO - 10.1016/S0168-583X(99)00682-5
M3 - Article
SN - 0168-583X
VL - 161-163
SP - 651
EP - 655
JO - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research. Section B: Beam Interactions with Materials and Atoms
ER -