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Physical characterization of ALD AI2O3 films deposited on GaAs substrates
A. Franquet, T. Conard, W. Vandervorst, S. Sioncke, M. Caymax, A. Delabie, M.M. Heyns, M. Meuris, G. Brammertz, J.L. Hemmen, van, W. Keuning, W.M.M. Kessels
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
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