Photolithography as enabler of AMOLED displays beyond 1000 ppi

Paweł E. Malinowski, Tung Huei Ke, Atsushi Nakamura, Peter Vicca, Auke Jisk Kronemeijer, Marc Ameys, Jan Laurens van der Steen, Sören Steudel, Yoshitaka Kamochi, Yu Iwai, Gerwin Gelinck, Paul Heremans

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Abstract

This paper describes the potential of hi-res display fabrication using OLED photolithography. We demonstrate 1250 ppi multicolor arrays, pixel scaling down to 3 µm pitch, integration in active displays, and improving lifetime after patterning (200 hours T75, smOLEDs). Photolithography can enable low-cost, high resolution displays for the 8K - VR era.

Original languageEnglish
Pages (from-to)623-626
Number of pages4
JournalSID International Symposium : Digest of Technical Papers
Volume48
Issue number1
DOIs
Publication statusPublished - 1 Jan 2017
Event2017 SID Symposium, Seminar, and Exhibition - Los Angeles, United States
Duration: 21 May 201726 May 2017
http://www.displayweek.org/2017.aspx

Keywords

  • AMOLED displays
  • Augmented reality
  • Organic light emitting diode
  • Photolithography
  • RGB OLEDs
  • Ultra-high resolution
  • Virtual reality

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    Malinowski, P. E., Ke, T. H., Nakamura, A., Vicca, P., Kronemeijer, A. J., Ameys, M., van der Steen, J. L., Steudel, S., Kamochi, Y., Iwai, Y., Gelinck, G., & Heremans, P. (2017). Photolithography as enabler of AMOLED displays beyond 1000 ppi. SID International Symposium : Digest of Technical Papers, 48(1), 623-626. https://doi.org/10.1002/sdtp.11715