Photodetachment of negative ions in an RF etching plasma

J.L. Jauberteau; G.J. Meeusen; M. Haverlag; Gerrit M.W. Kroesen; Frits J. de Hoog

Photodetachment of negative ions in an RF etching plasma

J.L. Jauberteau
, G.J. Meeusen
, M. Haverlag
, Gerrit M.W. Kroesen
, Frits J. de Hoog

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

1 Downloads (Pure)

Original language	English
Title of host publication	ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990
Subtitle of host publication	Abstracts of Invited Talks and Contributed Papers
Editors	B. Dubreuil
Publisher	European Physical Society (EPS)
Pages	96-97
Publication status	Published - 1990
Event	10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, (ESCAMPIG 1990) - Orleans, France Duration: 28 Aug 1990 → 31 Aug 1990

Publication series

Name	Europhysics conference abstracts
Volume	14E
ISSN (Print)	0378-2271

Conference

Conference	10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, (ESCAMPIG 1990)
Country/Territory	France
City	Orleans
Period	28/08/90 → 31/08/90

Cite this

Jauberteau, J. L., Meeusen, G. J., Haverlag, M., Kroesen, G. M. W., & de Hoog, F. J. (1990). Photodetachment of negative ions in an RF etching plasma. In B. Dubreuil (Ed.), ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990: Abstracts of Invited Talks and Contributed Papers (pp. 96-97). (Europhysics conference abstracts; Vol. 14E). European Physical Society (EPS).

Jauberteau, J.L. ; Meeusen, G.J. ; Haverlag, M. et al. / Photodetachment of negative ions in an RF etching plasma. ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990: Abstracts of Invited Talks and Contributed Papers. editor / B. Dubreuil. European Physical Society (EPS), 1990. pp. 96-97 (Europhysics conference abstracts).

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title = "Photodetachment of negative ions in an RF etching plasma",

author = "J.L. Jauberteau and G.J. Meeusen and M. Haverlag and Kroesen, \{Gerrit M.W.\} and \{de Hoog\}, \{Frits J.\}",

year = "1990",

language = "English",

series = "Europhysics conference abstracts",

publisher = "European Physical Society (EPS)",

pages = "96--97",

editor = "B. Dubreuil",

booktitle = "ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990",

note = "10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, (ESCAMPIG 1990) ; Conference date: 28-08-1990 Through 31-08-1990",

}

Jauberteau, JL, Meeusen, GJ, Haverlag, M, Kroesen, GMW & de Hoog, FJ 1990, Photodetachment of negative ions in an RF etching plasma. in B Dubreuil (ed.), ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990: Abstracts of Invited Talks and Contributed Papers. Europhysics conference abstracts, vol. 14E, European Physical Society (EPS), pp. 96-97, 10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, (ESCAMPIG 1990), Orleans, France, 28/08/90.

Photodetachment of negative ions in an RF etching plasma. / Jauberteau, J.L.; Meeusen, G.J.; Haverlag, M. et al.
ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990: Abstracts of Invited Talks and Contributed Papers. ed. / B. Dubreuil. European Physical Society (EPS), 1990. p. 96-97 (Europhysics conference abstracts; Vol. 14E).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Photodetachment of negative ions in an RF etching plasma

AU - Jauberteau, J.L.

AU - Meeusen, G.J.

AU - Haverlag, M.

AU - Kroesen, Gerrit M.W.

AU - de Hoog, Frits J.

PY - 1990

Y1 - 1990

M3 - Conference contribution

T3 - Europhysics conference abstracts

SP - 96

EP - 97

BT - ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990

A2 - Dubreuil, B.

PB - European Physical Society (EPS)

T2 - 10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, (ESCAMPIG 1990)

Y2 - 28 August 1990 through 31 August 1990

ER -

Jauberteau JL, Meeusen GJ, Haverlag M, Kroesen GMW, de Hoog FJ. Photodetachment of negative ions in an RF etching plasma. In Dubreuil B, editor, ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990: Abstracts of Invited Talks and Contributed Papers. European Physical Society (EPS). 1990. p. 96-97. (Europhysics conference abstracts).