Photodetachment effect in a radio frequency plasma in CF4

J.L. Jauberteau; G.J. Meeusen; M. Haverlag; G.M.W. Kroesen; F.J. Hoog, de

doi:10.1063/1.101990

Photodetachment effect in a radio frequency plasma in CF4

J.L. Jauberteau, G.J. Meeusen, M. Haverlag, G.M.W. Kroesen, F.J. Hoog, de

Research output: Contribution to journal › Article › Academic › peer-review

29 Citations (Scopus)

191 Downloads (Pure)

Abstract

Experiments to study negative ion densities have been carried out using the photodetachment effect in a rf plasma in CF4. Electrons are detached from the negative ions under the influence of the pulse of a Nd:YAG laser. The induced increase of the electron density is measured as a function of time using the shift of the resonance frequency of a microwave cavity containing the plasma. The negative ion density [F-] is found to be about (4±1)×1015 m-3, a factor 4±1 higher than the electron density.

Original language	English
Pages (from-to)	2597-2599
Journal	Applied Physics Letters
Volume	55
Issue number	25
DOIs	https://doi.org/10.1063/1.101990
Publication status	Published - 1989

Access to Document

10.1063/1.101990

Metis219649Final published version, 255 KB

Cite this

@article{d3094dbedd764df99604329bf5dcdaa9,

title = "Photodetachment effect in a radio frequency plasma in CF4",

abstract = "Experiments to study negative ion densities have been carried out using the photodetachment effect in a rf plasma in CF4. Electrons are detached from the negative ions under the influence of the pulse of a Nd:YAG laser. The induced increase of the electron density is measured as a function of time using the shift of the resonance frequency of a microwave cavity containing the plasma. The negative ion density [F-] is found to be about (4±1)×1015 m-3, a factor 4±1 higher than the electron density.",

author = "J.L. Jauberteau and G.J. Meeusen and M. Haverlag and G.M.W. Kroesen and {Hoog, de}, F.J.",

year = "1989",

doi = "10.1063/1.101990",

language = "English",

volume = "55",

pages = "2597--2599",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "25",

}

TY - JOUR

T1 - Photodetachment effect in a radio frequency plasma in CF4

AU - Jauberteau, J.L.

AU - Meeusen, G.J.

AU - Haverlag, M.

AU - Kroesen, G.M.W.

AU - Hoog, de, F.J.

PY - 1989

Y1 - 1989

N2 - Experiments to study negative ion densities have been carried out using the photodetachment effect in a rf plasma in CF4. Electrons are detached from the negative ions under the influence of the pulse of a Nd:YAG laser. The induced increase of the electron density is measured as a function of time using the shift of the resonance frequency of a microwave cavity containing the plasma. The negative ion density [F-] is found to be about (4±1)×1015 m-3, a factor 4±1 higher than the electron density.

AB - Experiments to study negative ion densities have been carried out using the photodetachment effect in a rf plasma in CF4. Electrons are detached from the negative ions under the influence of the pulse of a Nd:YAG laser. The induced increase of the electron density is measured as a function of time using the shift of the resonance frequency of a microwave cavity containing the plasma. The negative ion density [F-] is found to be about (4±1)×1015 m-3, a factor 4±1 higher than the electron density.

U2 - 10.1063/1.101990

DO - 10.1063/1.101990

M3 - Article

SN - 0003-6951

VL - 55

SP - 2597

EP - 2599

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 25

ER -

Photodetachment effect in a radio frequency plasma in CF4

Abstract

Access to Document

Fingerprint

Cite this