Photocrosslinking of ferroelectric polymers and its application in three-dimensional memory arrays

A. J.J.M. Van Breemen, J.B.P.H. Van Der Putten, R. Cai, K. Reimann, A. W. Marsman, N. Willard, D. M. De Leeuw, G. H. Gelinck

Research output: Contribution to journalArticleAcademicpeer-review

19 Citations (Scopus)

Abstract

An I-line photolithography process for ferroelectric polymers is developed. It is based on photocrosslinking using a bisazide photoinitiator. Patterned layers were realized down to 1-2μm resolution. Crosslinking yields a close-to-insoluble ferroelectric polymer network that counter intuitively has similar ferroelectric properties as a noncrosslinked film. The negative process is used to stack ferroelectric films on top of each other to make three-dimensional cross-bar arrays of nonvolatile ferroelectric capacitor memories.

Original languageEnglish
Article number183302
Number of pages3
JournalApplied Physics Letters
Volume98
Issue number18
DOIs
Publication statusPublished - 2 May 2011
Externally publishedYes

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