Abstract
The development of sophisticated advanced vibration isolation is important because even the minutest vibrations have disastrous effects on the performance of static and moving parts in high-precision machines. This paper concerns with the isolation of these vibrations for a large static body in an advanced micro-lithographic system, where a passive/active electromagnetic solution is presented. In these configurations passive permanent magnets (PM) provide the gravity compensation and active electromagnets the accurate positioning. This paper only considers the applicability of a passive magnetic solution for this high force gravity compensation application, or, more specifically, the influence of various PM array topologies on the force density. Further, fast-solving analytical models are presented and consequently are used to illustrate the feasibility of using passive permanent magnets for gravity compensation in this demanding high precision industrial application.
Original language | English |
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Pages (from-to) | 671-680 |
Number of pages | 10 |
Journal | Journal of System Design and Dynamics |
Volume | 3 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2009 |