Particle formation in RF silane plasmas

M. Sorokin; L. Boufendi; H.J. Schouten; G.M.W. Kroesen; W.W. Stoffels

Particle formation in RF silane plasmas

M. Sorokin, L. Boufendi, H.J. Schouten, G.M.W. Kroesen, W.W. Stoffels

Elementary Processes in Gas Discharges

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Abstract

In this work we present experimental results obtained using the microwave resonance technique for electron density measurements combined with electrical characterisation of a low pressure rf discharge. Electron density measurements in a SiH4/He/Ar mixture showed that the electron density experiences a peak at around 300 µs after the plasma ignition with a characteristic rise time of 80 µs, followed by a rapid decrease with a characteristic time of 0.66 ms. This decrease is not observed in pure argon and should most probably be attributed to the formation of negative ions and particles in the silane plasma.

Original language	English
Title of host publication	Proceedings of the 27th International Conference on Phenomena in Ionised Gases (XXVII ICPIG 2005) 17-22 July 2005, Eindhoven, the Netherlands
Pages	12-447-
Publication status	Published - 2005

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title = "Particle formation in RF silane plasmas",

abstract = "In this work we present experimental results obtained using the microwave resonance technique for electron density measurements combined with electrical characterisation of a low pressure rf discharge. Electron density measurements in a SiH4/He/Ar mixture showed that the electron density experiences a peak at around 300 µs after the plasma ignition with a characteristic rise time of 80 µs, followed by a rapid decrease with a characteristic time of 0.66 ms. This decrease is not observed in pure argon and should most probably be attributed to the formation of negative ions and particles in the silane plasma.",

author = "M. Sorokin and L. Boufendi and H.J. Schouten and G.M.W. Kroesen and W.W. Stoffels",

year = "2005",

language = "English",

pages = "12--447--",

booktitle = "Proceedings of the 27th International Conference on Phenomena in Ionised Gases (XXVII ICPIG 2005) 17-22 July 2005, Eindhoven, the Netherlands",

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TY - GEN

T1 - Particle formation in RF silane plasmas

AU - Sorokin, M.

AU - Boufendi, L.

AU - Schouten, H.J.

AU - Kroesen, G.M.W.

AU - Stoffels, W.W.

PY - 2005

Y1 - 2005

N2 - In this work we present experimental results obtained using the microwave resonance technique for electron density measurements combined with electrical characterisation of a low pressure rf discharge. Electron density measurements in a SiH4/He/Ar mixture showed that the electron density experiences a peak at around 300 µs after the plasma ignition with a characteristic rise time of 80 µs, followed by a rapid decrease with a characteristic time of 0.66 ms. This decrease is not observed in pure argon and should most probably be attributed to the formation of negative ions and particles in the silane plasma.

AB - In this work we present experimental results obtained using the microwave resonance technique for electron density measurements combined with electrical characterisation of a low pressure rf discharge. Electron density measurements in a SiH4/He/Ar mixture showed that the electron density experiences a peak at around 300 µs after the plasma ignition with a characteristic rise time of 80 µs, followed by a rapid decrease with a characteristic time of 0.66 ms. This decrease is not observed in pure argon and should most probably be attributed to the formation of negative ions and particles in the silane plasma.

M3 - Conference contribution

SP - 12-447-

BT - Proceedings of the 27th International Conference on Phenomena in Ionised Gases (XXVII ICPIG 2005) 17-22 July 2005, Eindhoven, the Netherlands

ER -

Particle formation in RF silane plasmas

Abstract

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