P-111 : a thin film encapsulation stack for PLED and OLED displays

F.J.H. Assche, van; R.T. Vangheluwe; J.W.C. Maes; W.S. Mischke; M.D. Bijker; F.C. Dings; M.F.J. Evers; W.M.M. Kessels; M.C.M. Sanden, van de

doi:10.1889/1.1831072

P-111 : a thin film encapsulation stack for PLED and OLED displays

F.J.H. Assche, van
, R.T. Vangheluwe
, J.W.C. Maes
, W.S. Mischke
, M.D. Bijker
, F.C. Dings
, M.F.J. Evers
, W.M.M. Kessels
, M.C.M. Sanden, van de

Research output: Contribution to journal › Article › Academic › peer-review

Abstract

For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.

Original language	English
Pages (from-to)	695-697
Journal	Digest of Technical Papers - SID International Symposium
Volume	35
Issue number	1
DOIs	https://doi.org/10.1889/1.1831072
Publication status	Published - 2004

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title = "P-111 : a thin film encapsulation stack for PLED and OLED displays",

abstract = "For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50\% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90\% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.",

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year = "2004",

doi = "10.1889/1.1831072",

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AU - Assche, van, F.J.H.

AU - Vangheluwe, R.T.

AU - Maes, J.W.C.

AU - Mischke, W.S.

AU - Bijker, M.D.

AU - Dings, F.C.

AU - Evers, M.F.J.

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

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Y1 - 2004

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AB - For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.

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DO - 10.1889/1.1831072

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JF - Digest of Technical Papers - SID International Symposium

IS - 1

ER -

P-111 : a thin film encapsulation stack for PLED and OLED displays

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