Abstract
For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.
Original language | English |
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Pages (from-to) | 695-697 |
Journal | Digest of Technical Papers - SID International Symposium |
Volume | 35 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2004 |