P-111 : a thin film encapsulation stack for PLED and OLED displays

F.J.H. Assche, van, R.T. Vangheluwe, J.W.C. Maes, W.S. Mischke, M.D. Bijker, F.C. Dings, M.F.J. Evers, W.M.M. Kessels, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

Abstract

For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.
Original languageEnglish
Pages (from-to)695-697
JournalSID International Symposium : Digest of Technical Papers
Volume35
Issue number1
DOIs
Publication statusPublished - 2004

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    Assche, van, F. J. H., Vangheluwe, R. T., Maes, J. W. C., Mischke, W. S., Bijker, M. D., Dings, F. C., Evers, M. F. J., Kessels, W. M. M., & Sanden, van de, M. C. M. (2004). P-111 : a thin film encapsulation stack for PLED and OLED displays. SID International Symposium : Digest of Technical Papers, 35(1), 695-697. https://doi.org/10.1889/1.1831072