For a thin film (<1 µm) encapsulation stack consisting of only 3 plasma deposited silicon nitride layers separated by a thin (<100 nm) organic layer, a water permeation rate of below 10–5 g/m2 per day at 50 °C and 50% rH has been measured using the Ca test. PLED lifetimes of over 500 hours at 60 °C and 90% rH have been reached locally. While the Ca test indicates that pinhole free encapsulation is possible, edge and particle related defects still forecast a challenge for device encapsulation.
|Journal||SID International Symposium : Digest of Technical Papers|
|Publication status||Published - 2004|
Assche, van, F. J. H., Vangheluwe, R. T., Maes, J. W. C., Mischke, W. S., Bijker, M. D., Dings, F. C., Evers, M. F. J., Kessels, W. M. M., & Sanden, van de, M. C. M. (2004). P-111 : a thin film encapsulation stack for PLED and OLED displays. SID International Symposium : Digest of Technical Papers, 35(1), 695-697. https://doi.org/10.1889/1.1831072