Abstract
The authors demonstrate direct electron-beam writing on conjugated polymers as patterning route to realize plastic optoelectronic devices. Lithography was carried out by a 20 kV electron beam dose in the range of 0-360 μC cm2, with no need for masking or development/etching processes. The features could be employed for the fabrication of polymer distributed feedback lasers, exhibiting optically pumped lasing in the range of 607-620 nm, with a spectral linewidth around 1 nm and a threshold excitation fluence of 34 μJ cm2.
Original language | English |
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Article number | 101110 |
Pages (from-to) | 101110-1/3 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 91 |
Issue number | 10 |
DOIs | |
Publication status | Published - 13 Sep 2007 |