Optimization of a single-step reactive ion etching process for InP photonic integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands
Pages	1-4
Publication status	Published - 2014

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@inproceedings{273252d284224564ad79fb6957c4af93,

title = "Optimization of a single-step reactive ion etching process for InP photonic integration",

author = "Y. Jiao and {Vries, de}, T. and L. Shen and H.P.M.M. Ambrosius and M.K. Smit and {Tol, van der}, J.J.G.M.",

year = "2014",

language = "English",

pages = "1--4",

booktitle = "Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands",

}

Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands. 2014. p. 1-4.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Optimization of a single-step reactive ion etching process for InP photonic integration

AU - Jiao, Y.

AU - Vries, de, T.

AU - Shen, L.

AU - Ambrosius, H.P.M.M.

AU - Smit, M.K.

AU - Tol, van der, J.J.G.M.

PY - 2014

Y1 - 2014

M3 - Conference contribution

SP - 1

EP - 4

BT - Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands

ER -