Optimization of a single-step reactive ion etching process for InP photonic integration

Y. Jiao, T. Vries, de, L. Shen, H.P.M.M. Ambrosius, M.K. Smit, J.J.G.M. Tol, van der

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Original languageEnglish
Title of host publicationProceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 3-4 November 2014, Enschede, the Netherlands
Publication statusPublished - 2014

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