Abstract
Atmospheric-pressure plasma jets (APPJs) can offer high-quality etch of photoresist at rates up to 10 µm/min, compared to 10 - 100 nm/min using traditional low-pressure methods, while avoiding the inconveniences of operating vacuum systems. We determined that the removal rate of photoresist is strongly linked with the flux of atomic oxygen in the APPJ effluent as measured using laser-based diagnostics (TALIF).
Original language | English |
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Title of host publication | Proceedings of the 22nd International Symposium on Plasma Chemistry, 5-10 July 2015, Antwerp, Belgium |
Pages | 1-4 |
Number of pages | 4 |
Publication status | Published - 2015 |
Event | 22nd International Symposium on Plasma Chemistry (ISPC 22), July 5-10, 2015, Antwerp, Belgium - Antwerp, Belgium Duration: 5 Jul 2015 → 10 Jul 2015 https://www.uantwerpen.be/en/conferences/ispc22/ |
Conference
Conference | 22nd International Symposium on Plasma Chemistry (ISPC 22), July 5-10, 2015, Antwerp, Belgium |
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Abbreviated title | ISPC 22 |
Country/Territory | Belgium |
City | Antwerp |
Period | 5/07/15 → 10/07/15 |
Internet address |