Optimal integration and test planning applied to lithographic systems

R. Boumen, I.S.M. Jong, de, J.M. Mortel - Fronczak, van de, J.E. Rooda

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    In the current integration and test phase of the development of a complex system, (the "right side" of the V-model) planning is becoming more and more difficult because of: 1) variability in delivery times of components, 2) failing tests and subsequent repairs, 3) resource changes and the use of component models, and 4) the growing system complexity and growing number of components and tests. Manually created integration and test plans are often not optimal regarding time-to-market. Furthermore, creating and maintaining these plans costs a lot of effort. In this paper, we introduce a method that allows to automatically create optimal integration and test plans. This method can be used by intelligent enterprises to shorten the time-to-market of a system and to reduce the effort needed to create and maintain integration and test plans. We illustrate this method with two cases studies related to the development of ASML lithographic machines (ASML 2006).
    Original languageEnglish
    Title of host publicationProceedings of the 17th International Symposium of the International Council on Systems Engineering (INCOSE 2007) 24-28 June 2007, San Diego, California, USA
    Place of PublicationNew York, New York, USA
    Pages1/13-
    Publication statusPublished - 2007
    Event17th International Symposium of the InternationaI Council on Systems Engineering (INCOSE 2007) - San Diego, California, United States
    Duration: 24 Jun 200728 Jun 2007

    Conference

    Conference17th International Symposium of the InternationaI Council on Systems Engineering (INCOSE 2007)
    Abbreviated titleINCOSE 2007
    Country/TerritoryUnited States
    CitySan Diego, California
    Period24/06/0728/06/07

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