Optical second harmonic generation as a diagnostic tool in Ar+ and XeF2 beam studies of silicon

J.J.H. Gielis, A.A.E. Stevens, P.M. Gevers, H.C.W. Beijerinck, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationProceedings of the 52th AVS International Symposium, 30 October - 4 November 2005, Hynes Convention Center, Boston, USA
Place of PublicationBoston, USA
Publication statusPublished - 2005
Event52th International Symposium of the American Vacuum Society - Boston, Massachusetts, United States
Duration: 30 Oct 20054 Nov 2005

Conference

Conference52th International Symposium of the American Vacuum Society
Abbreviated titleAVS 52
Country/TerritoryUnited States
CityBoston, Massachusetts
Period30/10/054/11/05

Cite this