Optical emission spectroscopy on Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasmas

A. Graaf, de, M.C.M. Sanden, van de, D.C. Schram, E. Aldea, G. Dinescu

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Abstract

This work has been carried out in connection with the possibilities to deposit carbon nitride materials by expansion thermal plasma assisted chemical vapour deposition (ETP-A-CVD). With the same technique high deposition rates and good quality a-Si:H and a-C:H materials have been obtained. A study of the intensity of atomic lines and molecular bands in a Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasma has been performed. In the case of the Ar/N/sub 2//C/sub 2/H/sub 2/ mixture rotational and vibrational temperatures were obtained by comparing computer simulated spectra of the CN(B/sup 2/ Sigma -X/sup 2/ Sigma , Delta v=0) spectral system bands with the experimental spectra. The CN ground state density is determined by taking into account the self-absorption of the CN bands
Original languageEnglish
Title of host publicationXXIII International Conference on Phenomena in Ionized Gases, ICPIG Proceedings. Contributed Papers IV
EditorsM.C. Bordage, A. Gleizes
Place of PublicationToulouse, France
PublisherCentre de Phys. Plasmas et leurs Applications de Toulouse
Pages254-255
Publication statusPublished - 1997

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    Graaf, de, A., Sanden, van de, M. C. M., Schram, D. C., Aldea, E., & Dinescu, G. (1997). Optical emission spectroscopy on Ar/N/sub 2/ and Ar/N/sub 2//C/sub 2/H/sub 2/ expanding thermal plasmas. In M. C. Bordage, & A. Gleizes (Eds.), XXIII International Conference on Phenomena in Ionized Gases, ICPIG Proceedings. Contributed Papers IV (pp. 254-255). Centre de Phys. Plasmas et leurs Applications de Toulouse.