Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes

A.J.M. Mackus; S.B.S. Heil; E. Langereis; H.C.M. Knoops; M.C.M. Sanden, van de; W.M.M. Kessels

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes

A.J.M. Mackus, S.B.S. Heil, E. Langereis, H.C.M. Knoops, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
Editors	W.M.M. Kessels, A. Delabie
Place of Publication	S.n.
Publisher	s.n.
Pages	P-76-
Publication status	Published - 2008

Cite this

Mackus, A. J. M., Heil, S. B. S., Langereis, E., Knoops, H. C. M., Sanden, van de, M. C. M., & Kessels, W. M. M. (2008). Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes. In W. M. M. Kessels, & A. Delabie (Eds.), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts) (pp. P-76-). s.n..

Mackus, A.J.M. ; Heil, S.B.S. ; Langereis, E. et al. / Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes. Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). editor / W.M.M. Kessels ; A. Delabie. S.n. : s.n., 2008. pp. P-76-

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title = "Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes",

author = "A.J.M. Mackus and S.B.S. Heil and E. Langereis and H.C.M. Knoops and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2008",

language = "English",

pages = "P--76--",

editor = "W.M.M. Kessels and A. Delabie",

booktitle = "Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)",

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Mackus, AJM, Heil, SBS, Langereis, E, Knoops, HCM , Sanden, van de, MCM & Kessels, WMM 2008, Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes. in WMM Kessels & A Delabie (eds), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). s.n., S.n., pp. P-76-.

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes. / Mackus, A.J.M.; Heil, S.B.S.; Langereis, E. et al.

Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). ed. / W.M.M. Kessels; A. Delabie. S.n. : s.n., 2008. p. P-76-.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes

AU - Mackus, A.J.M.

AU - Heil, S.B.S.

AU - Langereis, E.

AU - Knoops, H.C.M.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2008

Y1 - 2008

M3 - Conference contribution

SP - P-76-

BT - Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)

A2 - Kessels, W.M.M.

A2 - Delabie, A.

PB - s.n.

CY - S.n.

ER -

Mackus AJM, Heil SBS, Langereis E, Knoops HCM , Sanden, van de MCM , Kessels WMM. Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes. In Kessels WMM, Delabie A, editors, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). S.n.: s.n. 2008. p. P-76-