Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes

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Original languageEnglish
Title of host publicationProceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
EditorsW.M.M. Kessels, A. Delabie
Place of PublicationS.n.
Publishers.n.
PagesP-76-
Publication statusPublished - 2008

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Mackus, A. J. M., Heil, S. B. S., Langereis, E., Knoops, H. C. M., Sanden, van de, M. C. M., & Kessels, W. M. M. (2008). Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes. In W. M. M. Kessels, & A. Delabie (Eds.), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts) (pp. P-76-). s.n..