Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.
|Title of host publication||7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings|
|Place of Publication||Eindhoven|
|Publisher||Eindhoven University of Technology|
|Publication status||Published - 1985|