Optical diagnostics for plasma etching

T.H.J. Bisschops, G.M.W. Kroesen, E.M. Veldhuizen, van, C.J.H. de Zeeuw

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.
Original languageEnglish
Title of host publication7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings
EditorsC.J. Timmermans
Place of PublicationEindhoven
PublisherEindhoven University of Technology
Pages617-621
Volume2
Publication statusPublished - 1985

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