Optical diagnostics for plasma etching

T.H.J. Bisschops, G.M.W. Kroesen, E.M. Veldhuizen, van, C.J.H. de Zeeuw

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.
Original languageEnglish
Title of host publication7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings
EditorsC.J. Timmermans
Place of PublicationEindhoven
PublisherEindhoven University of Technology
Pages617-621
Volume2
Publication statusPublished - 1985

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plasma etching
ellipsometers
absorption spectroscopy
interferometers
reactors
wafers
gases
spectroscopy

Cite this

Bisschops, T. H. J., Kroesen, G. M. W., Veldhuizen, van, E. M., & de Zeeuw, C. J. H. (1985). Optical diagnostics for plasma etching. In C. J. Timmermans (Ed.), 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings (Vol. 2, pp. 617-621). Eindhoven: Eindhoven University of Technology.
Bisschops, T.H.J. ; Kroesen, G.M.W. ; Veldhuizen, van, E.M. ; de Zeeuw, C.J.H. / Optical diagnostics for plasma etching. 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings. editor / C.J. Timmermans. Vol. 2 Eindhoven : Eindhoven University of Technology, 1985. pp. 617-621
@inproceedings{cce4f863883b4da58652896623e48ce9,
title = "Optical diagnostics for plasma etching",
abstract = "Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.",
author = "T.H.J. Bisschops and G.M.W. Kroesen and {Veldhuizen, van}, E.M. and {de Zeeuw}, C.J.H.",
year = "1985",
language = "English",
volume = "2",
pages = "617--621",
editor = "C.J. Timmermans",
booktitle = "7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings",
publisher = "Eindhoven University of Technology",

}

Bisschops, THJ, Kroesen, GMW, Veldhuizen, van, EM & de Zeeuw, CJH 1985, Optical diagnostics for plasma etching. in CJ Timmermans (ed.), 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings. vol. 2, Eindhoven University of Technology, Eindhoven, pp. 617-621.

Optical diagnostics for plasma etching. / Bisschops, T.H.J.; Kroesen, G.M.W.; Veldhuizen, van, E.M.; de Zeeuw, C.J.H.

7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings. ed. / C.J. Timmermans. Vol. 2 Eindhoven : Eindhoven University of Technology, 1985. p. 617-621.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Optical diagnostics for plasma etching

AU - Bisschops, T.H.J.

AU - Kroesen, G.M.W.

AU - Veldhuizen, van, E.M.

AU - de Zeeuw, C.J.H.

PY - 1985

Y1 - 1985

N2 - Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.

AB - Several optical diagnostics were used to det. plasma properties and etch rates in an single wafer etch reactor. Results of UV-visible spectroscopy and IR absorption spectroscopy, indicating different mol. species and their densities are presented. The construction of an interferometer to det. the gas temp. and of an ellipsometer to det. the in situ each rate are also described.

M3 - Conference contribution

VL - 2

SP - 617

EP - 621

BT - 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings

A2 - Timmermans, C.J.

PB - Eindhoven University of Technology

CY - Eindhoven

ER -

Bisschops THJ, Kroesen GMW, Veldhuizen, van EM, de Zeeuw CJH. Optical diagnostics for plasma etching. In Timmermans CJ, editor, 7th International Symposium on Plasma Chemistry, Eindhoven, The Netherlands, July 1-15, 1985: symposium proceedings. Vol. 2. Eindhoven: Eindhoven University of Technology. 1985. p. 617-621