Nowadays high electron density plasmas are, beside their fundamental interest, widely used for many applications, e.g., light sources and plasma processing. The well known examples of high electron density plasmas can be found among the class of thermal plasmas as, e.g., the Inductively Coupled Plasma (ICP) and the Wall Stabilized Cascaded Arc (WSCA). Usually the pressure of the plasma is high, i.e., sub atmospheric to atmospheric. Other examples are the plasmas generated in tokamaks for fusion purposes and the recently exploited plasmas for etching and deposition devices such as the Electron Cyclotron Resonance plasmas. For the plasmas mentioned, the electron density is typical in the range of 1018 to 1023 m3, and the electron velocity distribution is close to a Maxwellian velocity distribution.
|Title of host publication||Microwave discharges : fundamentals and applications|
|Editors||C.M. Ferreira, M. Moisan|
|Place of Publication||London|
|Publication status||Published - 1993|
|Name||NATO ASI series, Series B: Physics|