Optical characterization of plasma-deposited SiO2-like layers on anisotropic polymeric substrates

G. Aresta; P.A. Premkumar; S. Starostine; H.W. Vries, de; M.C.M. Sanden, van de; M. Creatore

doi:10.1002/ppap.200900109

Optical characterization of plasma-deposited SiO2-like layers on anisotropic polymeric substrates

G. Aresta, P.A. Premkumar, S. Starostine, H.W. Vries, de, M.C.M. Sanden, van de, M. Creatore

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Abstract

In this paper, the characterization of the optical anisotropy of poly(ethylene-2,6-naphthalate) (PEN) by means of Transmission Generalized Ellipsometry coupled with reflection multi-angle Spectroscopic Ellipsometry (SE) measurements is presented. This study is functional to the determination of the refractive index of atmospheric pressure plasma-deposited SiO2-like layers deposited on PEN. The effect of the plasma duty cycle (DC) on the film properties is investigated. From the analysis of the optical properties, complemented with chemical and morphological studies, it is concluded that the increase in DC is responsible for the layer densification process, eventually causing an improvement in the PEN/SiO2 system barrier properties.

Original language	English
Pages (from-to)	766-774
Journal	Plasma Processes and Polymers
Volume	7
Issue number	9-10
DOIs	https://doi.org/10.1002/ppap.200900109
Publication status	Published - 2010

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title = "Optical characterization of plasma-deposited SiO2-like layers on anisotropic polymeric substrates",

abstract = "In this paper, the characterization of the optical anisotropy of poly(ethylene-2,6-naphthalate) (PEN) by means of Transmission Generalized Ellipsometry coupled with reflection multi-angle Spectroscopic Ellipsometry (SE) measurements is presented. This study is functional to the determination of the refractive index of atmospheric pressure plasma-deposited SiO2-like layers deposited on PEN. The effect of the plasma duty cycle (DC) on the film properties is investigated. From the analysis of the optical properties, complemented with chemical and morphological studies, it is concluded that the increase in DC is responsible for the layer densification process, eventually causing an improvement in the PEN/SiO2 system barrier properties.",

author = "G. Aresta and P.A. Premkumar and S. Starostine and {Vries, de}, H.W. and {Sanden, van de}, M.C.M. and M. Creatore",

year = "2010",

doi = "10.1002/ppap.200900109",

language = "English",

volume = "7",

pages = "766--774",

journal = "Plasma Processes and Polymers",

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T1 - Optical characterization of plasma-deposited SiO2-like layers on anisotropic polymeric substrates

AU - Aresta, G.

AU - Premkumar, P.A.

AU - Starostine, S.

AU - Vries, de, H.W.

AU - Sanden, van de, M.C.M.

AU - Creatore, M.

PY - 2010

Y1 - 2010

N2 - In this paper, the characterization of the optical anisotropy of poly(ethylene-2,6-naphthalate) (PEN) by means of Transmission Generalized Ellipsometry coupled with reflection multi-angle Spectroscopic Ellipsometry (SE) measurements is presented. This study is functional to the determination of the refractive index of atmospheric pressure plasma-deposited SiO2-like layers deposited on PEN. The effect of the plasma duty cycle (DC) on the film properties is investigated. From the analysis of the optical properties, complemented with chemical and morphological studies, it is concluded that the increase in DC is responsible for the layer densification process, eventually causing an improvement in the PEN/SiO2 system barrier properties.

AB - In this paper, the characterization of the optical anisotropy of poly(ethylene-2,6-naphthalate) (PEN) by means of Transmission Generalized Ellipsometry coupled with reflection multi-angle Spectroscopic Ellipsometry (SE) measurements is presented. This study is functional to the determination of the refractive index of atmospheric pressure plasma-deposited SiO2-like layers deposited on PEN. The effect of the plasma duty cycle (DC) on the film properties is investigated. From the analysis of the optical properties, complemented with chemical and morphological studies, it is concluded that the increase in DC is responsible for the layer densification process, eventually causing an improvement in the PEN/SiO2 system barrier properties.

U2 - 10.1002/ppap.200900109

DO - 10.1002/ppap.200900109

M3 - Article

SN - 1612-8850

VL - 7

SP - 766

EP - 774

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

IS - 9-10

ER -

Optical characterization of plasma-deposited SiO2-like layers on anisotropic polymeric substrates

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