On-wafer optical loss measurements using ring resonators with integrated sources and detectors

E. Bitincka, G. Gilardi, M.K. Smit

Research output: Contribution to journalArticleAcademicpeer-review

7 Citations (Scopus)
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Abstract

We demonstrate for the first time a fully integrated test structure dedicated to on-wafer propagation loss measurement. An integrated light source is used in combination with a resonant cavity and a full absorbing detector. It is fabricated in a multi project wafer run in an InP based foundry process. The probing of the integrated light source and detector with electrical signals avoids the reproducibility issues and time-overhead associated with high-precision optical alignment. The measurement accuracy, estimated to be ~±0.2, the compact footprint (~1.5 mm2), and the simple and fast measurement procedure make this approach an ideal candidate for the future characterization of propagation losses in both research and manufacturing environments.
Original languageEnglish
Article number6601212
Pages (from-to)6601212-1/12
Number of pages12
JournalIEEE Photonics Journal
Volume6
Issue number5
DOIs
Publication statusPublished - 2014

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