On the properties of nanoporous SiO2 films for single layer antireflection coating

Lilit Ghazaryan, Yusuf Sekman, Sven Schröder, Christian Mühlig, Igor Stevanovic, Roelene Botha, Morteza Aghaee, Mariadriana Creatore, Andreas Tünnermann, Adriana Szeghalmi (Corresponding author)

Research output: Contribution to journalArticleAcademicpeer-review

4 Citations (Scopus)

Abstract

Single layer antireflection coatings (SLAR) consisting of nanoporous silica (NP SiO2) films are developed by selective chemical etching of atomic layer deposited (ALD) Al2O3:SiO2 composite films. The reflective index of the final NP SiO2 film is finely adjusted from 1.132 to 1.400 at 600 nm wavelength by applying an appropriate ratio in the composite. To meet the requirements of the SLAR coatings from the deep UV (DUV) to the near IR (NIR) spectral range, the film thickness is controlled with nanometer precision by the ALD process. The SLAR are simultaneously applied on both sides of flat or highly curved substrates. Transmittance values above 99.4% are achieved even at a wavelength of 193 nm on fused silica substrates. Various characterization methods demonstrate the advantages of these SLAR with regard to impurities, optical losses, laser induced damage threshold (LIDT) properties, and surface super-hydrophilicity. The absorption losses at 193 nm wavelength as determined by laser induced deflection measurements amount to approximately 200 ppm, and to approximately 2 ppm at a wavelength of 1064 nm, while the scattering losses are around 30 ppm at 532 nm wavelength for quarter-wave layers. The LIDT values at 1064 nm are in the range of 93 J cm−2 being close to the values measured on the uncoated substrate.

Original languageEnglish
Article number1801229
Number of pages10
JournalAdvanced Engineering Materials
Volume21
Issue number6
DOIs
Publication statusPublished - 1 Jun 2019

Fingerprint

Antireflection coatings
antireflection coatings
Wavelength
Laser damage
wavelengths
Substrates
yield point
Optical losses
Hydrophilicity
Composite films
Fused silica
silicon dioxide
lasers
Silicon Dioxide
Film thickness
Etching
composite materials
Silica
Scattering
Impurities

Keywords

  • antireflection coatings
  • atomic layer deposition
  • laser induced damage threshold
  • nanoporous SiO films

Cite this

Ghazaryan, L., Sekman, Y., Schröder, S., Mühlig, C., Stevanovic, I., Botha, R., ... Szeghalmi, A. (2019). On the properties of nanoporous SiO2 films for single layer antireflection coating. Advanced Engineering Materials, 21(6), [1801229]. https://doi.org/10.1002/adem.201801229
Ghazaryan, Lilit ; Sekman, Yusuf ; Schröder, Sven ; Mühlig, Christian ; Stevanovic, Igor ; Botha, Roelene ; Aghaee, Morteza ; Creatore, Mariadriana ; Tünnermann, Andreas ; Szeghalmi, Adriana. / On the properties of nanoporous SiO2 films for single layer antireflection coating. In: Advanced Engineering Materials. 2019 ; Vol. 21, No. 6.
@article{d9a3f11fd57743a482fb8b6352608941,
title = "On the properties of nanoporous SiO2 films for single layer antireflection coating",
abstract = "Single layer antireflection coatings (SLAR) consisting of nanoporous silica (NP SiO2) films are developed by selective chemical etching of atomic layer deposited (ALD) Al2O3:SiO2 composite films. The reflective index of the final NP SiO2 film is finely adjusted from 1.132 to 1.400 at 600 nm wavelength by applying an appropriate ratio in the composite. To meet the requirements of the SLAR coatings from the deep UV (DUV) to the near IR (NIR) spectral range, the film thickness is controlled with nanometer precision by the ALD process. The SLAR are simultaneously applied on both sides of flat or highly curved substrates. Transmittance values above 99.4{\%} are achieved even at a wavelength of 193 nm on fused silica substrates. Various characterization methods demonstrate the advantages of these SLAR with regard to impurities, optical losses, laser induced damage threshold (LIDT) properties, and surface super-hydrophilicity. The absorption losses at 193 nm wavelength as determined by laser induced deflection measurements amount to approximately 200 ppm, and to approximately 2 ppm at a wavelength of 1064 nm, while the scattering losses are around 30 ppm at 532 nm wavelength for quarter-wave layers. The LIDT values at 1064 nm are in the range of 93 J cm−2 being close to the values measured on the uncoated substrate.",
keywords = "antireflection coatings, atomic layer deposition, laser induced damage threshold, nanoporous SiO films",
author = "Lilit Ghazaryan and Yusuf Sekman and Sven Schr{\"o}der and Christian M{\"u}hlig and Igor Stevanovic and Roelene Botha and Morteza Aghaee and Mariadriana Creatore and Andreas T{\"u}nnermann and Adriana Szeghalmi",
year = "2019",
month = "6",
day = "1",
doi = "10.1002/adem.201801229",
language = "English",
volume = "21",
journal = "Advanced Engineering Materials",
issn = "1428-1656",
publisher = "Wiley-VCH Verlag",
number = "6",

}

Ghazaryan, L, Sekman, Y, Schröder, S, Mühlig, C, Stevanovic, I, Botha, R, Aghaee, M, Creatore, M, Tünnermann, A & Szeghalmi, A 2019, 'On the properties of nanoporous SiO2 films for single layer antireflection coating', Advanced Engineering Materials, vol. 21, no. 6, 1801229. https://doi.org/10.1002/adem.201801229

On the properties of nanoporous SiO2 films for single layer antireflection coating. / Ghazaryan, Lilit; Sekman, Yusuf; Schröder, Sven; Mühlig, Christian; Stevanovic, Igor; Botha, Roelene; Aghaee, Morteza; Creatore, Mariadriana; Tünnermann, Andreas; Szeghalmi, Adriana (Corresponding author).

In: Advanced Engineering Materials, Vol. 21, No. 6, 1801229, 01.06.2019.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - On the properties of nanoporous SiO2 films for single layer antireflection coating

AU - Ghazaryan, Lilit

AU - Sekman, Yusuf

AU - Schröder, Sven

AU - Mühlig, Christian

AU - Stevanovic, Igor

AU - Botha, Roelene

AU - Aghaee, Morteza

AU - Creatore, Mariadriana

AU - Tünnermann, Andreas

AU - Szeghalmi, Adriana

PY - 2019/6/1

Y1 - 2019/6/1

N2 - Single layer antireflection coatings (SLAR) consisting of nanoporous silica (NP SiO2) films are developed by selective chemical etching of atomic layer deposited (ALD) Al2O3:SiO2 composite films. The reflective index of the final NP SiO2 film is finely adjusted from 1.132 to 1.400 at 600 nm wavelength by applying an appropriate ratio in the composite. To meet the requirements of the SLAR coatings from the deep UV (DUV) to the near IR (NIR) spectral range, the film thickness is controlled with nanometer precision by the ALD process. The SLAR are simultaneously applied on both sides of flat or highly curved substrates. Transmittance values above 99.4% are achieved even at a wavelength of 193 nm on fused silica substrates. Various characterization methods demonstrate the advantages of these SLAR with regard to impurities, optical losses, laser induced damage threshold (LIDT) properties, and surface super-hydrophilicity. The absorption losses at 193 nm wavelength as determined by laser induced deflection measurements amount to approximately 200 ppm, and to approximately 2 ppm at a wavelength of 1064 nm, while the scattering losses are around 30 ppm at 532 nm wavelength for quarter-wave layers. The LIDT values at 1064 nm are in the range of 93 J cm−2 being close to the values measured on the uncoated substrate.

AB - Single layer antireflection coatings (SLAR) consisting of nanoporous silica (NP SiO2) films are developed by selective chemical etching of atomic layer deposited (ALD) Al2O3:SiO2 composite films. The reflective index of the final NP SiO2 film is finely adjusted from 1.132 to 1.400 at 600 nm wavelength by applying an appropriate ratio in the composite. To meet the requirements of the SLAR coatings from the deep UV (DUV) to the near IR (NIR) spectral range, the film thickness is controlled with nanometer precision by the ALD process. The SLAR are simultaneously applied on both sides of flat or highly curved substrates. Transmittance values above 99.4% are achieved even at a wavelength of 193 nm on fused silica substrates. Various characterization methods demonstrate the advantages of these SLAR with regard to impurities, optical losses, laser induced damage threshold (LIDT) properties, and surface super-hydrophilicity. The absorption losses at 193 nm wavelength as determined by laser induced deflection measurements amount to approximately 200 ppm, and to approximately 2 ppm at a wavelength of 1064 nm, while the scattering losses are around 30 ppm at 532 nm wavelength for quarter-wave layers. The LIDT values at 1064 nm are in the range of 93 J cm−2 being close to the values measured on the uncoated substrate.

KW - antireflection coatings

KW - atomic layer deposition

KW - laser induced damage threshold

KW - nanoporous SiO films

UR - http://www.scopus.com/inward/record.url?scp=85067495922&partnerID=8YFLogxK

U2 - 10.1002/adem.201801229

DO - 10.1002/adem.201801229

M3 - Article

AN - SCOPUS:85067495922

VL - 21

JO - Advanced Engineering Materials

JF - Advanced Engineering Materials

SN - 1428-1656

IS - 6

M1 - 1801229

ER -

Ghazaryan L, Sekman Y, Schröder S, Mühlig C, Stevanovic I, Botha R et al. On the properties of nanoporous SiO2 films for single layer antireflection coating. Advanced Engineering Materials. 2019 Jun 1;21(6). 1801229. https://doi.org/10.1002/adem.201801229