On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma

R.J. Severens, M.C.M. Sanden, van de, H.J.M. Verhoeven, J. Bastiaanssen, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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Original languageEnglish
Title of host publicationPlasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum
Pages106
Publication statusPublished - 1996

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