On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma

R.J. Severens, M.C.M. Sanden, van de, H.J.M. Verhoeven, J. Bastiaanssen, D.C. Schram

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Original language	English
Title of host publication	Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum
Pages	106
Publication status	Published - 1996

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@inproceedings{64a57620e1574c9ea68722710bcee210,

title = "On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma",

author = "R.J. Severens and {Sanden, van de}, M.C.M. and H.J.M. Verhoeven and J. Bastiaanssen and D.C. Schram",

year = "1996",

language = "English",

pages = "106",

booktitle = "Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum",

}