On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma

R.J. Severens, M.C.M. Sanden, van de, H.J.M. Verhoeven, J. Bastiaanssen, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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Original languageEnglish
Title of host publicationPlasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum
Pages106
Publication statusPublished - 1996

Cite this

Severens, R. J., Sanden, van de, M. C. M., Verhoeven, H. J. M., Bastiaanssen, J., & Schram, D. C. (1996). On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma. In Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum (pp. 106)
Severens, R.J. ; Sanden, van de, M.C.M. ; Verhoeven, H.J.M. ; Bastiaanssen, J. ; Schram, D.C. / On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma. Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum. 1996. pp. 106
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Severens, RJ, Sanden, van de, MCM, Verhoeven, HJM, Bastiaanssen, J & Schram, DC 1996, On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma. in Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum. pp. 106.

On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma. / Severens, R.J.; Sanden, van de, M.C.M.; Verhoeven, H.J.M.; Bastiaanssen, J.; Schram, D.C.

Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum. 1996. p. 106.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

TY - GEN

T1 - On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma

AU - Severens, R.J.

AU - Sanden, van de, M.C.M.

AU - Verhoeven, H.J.M.

AU - Bastiaanssen, J.

AU - Schram, D.C.

PY - 1996

Y1 - 1996

M3 - Conference contribution

SP - 106

BT - Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum

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Severens RJ, Sanden, van de MCM, Verhoeven HJM, Bastiaanssen J, Schram DC. On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma. In Plasmatechnologie: 7. Bundesdeutsche Fachtagung, 13.-14. Maerz 1996, Rub-Bochum. 1996. p. 106