On the effect of substrate temperature on a-Si:H deposition using an expanding thermal plasma

R. J. Severens, M. C.M. van de Sanden, H. J.M. Verhoeven, J. Bastiaanssen, D. C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

12 Citations (Scopus)
56 Downloads (Pure)

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Chemical Compounds

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