On the description of an inductively coupled argon plasma

I.J.M.M. Raaijmakers; D.C. Schram; H.J.W. Schenkelaars; G.M.W. Kroesen; P.W.J.M. Boumans

On the description of an inductively coupled argon plasma

I.J.M.M. Raaijmakers, D.C. Schram, H.J.W. Schenkelaars, G.M.W. Kroesen, P.W.J.M. Boumans

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

54 Downloads (Pure)

Abstract

A model of an inductively coupled argon plasma (ICP), based on a characterisation with the electron density and a off equilibrium parameter, is shown to be in good agreement with measurements in the analytical or passive zone of the ICP, if an extra recombination path is assumed. The most probable candidate for this fast recombination path which is effective at low electron densities is dissociative recombination.

Original language	English
Title of host publication	ISPC-7 7th International Symposium on Plasma Chemistry, Eindhoven, the Netherlands July 1-5 1985 : symposium proceedings : vol. 2
Editors	C.J. Timmermans
Publisher	International Union of Pure and Applied Chemistry
Pages	823-829
Publication status	Published - 1985

Access to Document

publishers versionFinal published version, 1.88 MB

Cite this

Raaijmakers, I. J. M. M., Schram, D. C., Schenkelaars, H. J. W., Kroesen, G. M. W., & Boumans, P. W. J. M. (1985). On the description of an inductively coupled argon plasma. In C. J. Timmermans (Ed.), ISPC-7 7th International Symposium on Plasma Chemistry, Eindhoven, the Netherlands July 1-5 1985 : symposium proceedings : vol. 2 (pp. 823-829). International Union of Pure and Applied Chemistry.

@inproceedings{8f6493625f1144e8887ee89310e2e786,

title = "On the description of an inductively coupled argon plasma",

abstract = "A model of an inductively coupled argon plasma (ICP), based on a characterisation with the electron density and a off equilibrium parameter, is shown to be in good agreement with measurements in the analytical or passive zone of the ICP, if an extra recombination path is assumed. The most probable candidate for this fast recombination path which is effective at low electron densities is dissociative recombination.",

author = "I.J.M.M. Raaijmakers and D.C. Schram and H.J.W. Schenkelaars and G.M.W. Kroesen and P.W.J.M. Boumans",

year = "1985",

language = "English",

pages = "823--829",

editor = "C.J. Timmermans",

booktitle = "ISPC-7 7th International Symposium on Plasma Chemistry, Eindhoven, the Netherlands July 1-5 1985 : symposium proceedings : vol. 2",

publisher = "International Union of Pure and Applied Chemistry",

}

On the description of an inductively coupled argon plasma. / Raaijmakers, I.J.M.M.; Schram, D.C.; Schenkelaars, H.J.W. et al.
ISPC-7 7th International Symposium on Plasma Chemistry, Eindhoven, the Netherlands July 1-5 1985 : symposium proceedings : vol. 2. ed. / C.J. Timmermans. International Union of Pure and Applied Chemistry, 1985. p. 823-829.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - On the description of an inductively coupled argon plasma

AU - Raaijmakers, I.J.M.M.

AU - Schram, D.C.

AU - Schenkelaars, H.J.W.

AU - Kroesen, G.M.W.

AU - Boumans, P.W.J.M.

PY - 1985

Y1 - 1985

N2 - A model of an inductively coupled argon plasma (ICP), based on a characterisation with the electron density and a off equilibrium parameter, is shown to be in good agreement with measurements in the analytical or passive zone of the ICP, if an extra recombination path is assumed. The most probable candidate for this fast recombination path which is effective at low electron densities is dissociative recombination.

AB - A model of an inductively coupled argon plasma (ICP), based on a characterisation with the electron density and a off equilibrium parameter, is shown to be in good agreement with measurements in the analytical or passive zone of the ICP, if an extra recombination path is assumed. The most probable candidate for this fast recombination path which is effective at low electron densities is dissociative recombination.

M3 - Conference contribution

SP - 823

EP - 829

BT - ISPC-7 7th International Symposium on Plasma Chemistry, Eindhoven, the Netherlands July 1-5 1985 : symposium proceedings : vol. 2

A2 - Timmermans, C.J.

PB - International Union of Pure and Applied Chemistry

ER -

On the description of an inductively coupled argon plasma

Abstract

Access to Document

Fingerprint

Cite this