On the description of an inductively coupled argon plasma

I.J.M.M. Raaijmakers, D.C. Schram, H.J.W. Schenkelaars, G.M.W. Kroesen, P.W.J.M. Boumans

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A model of an inductively coupled argon plasma (ICP), based on a characterisation with the electron density and a off equilibrium parameter, is shown to be in good agreement with measurements in the analytical or passive zone of the ICP, if an extra recombination path is assumed. The most probable candidate for this fast recombination path which is effective at low electron densities is dissociative recombination.
Original languageEnglish
Title of host publicationISPC-7 7th International Symposium on Plasma Chemistry, Eindhoven, the Netherlands July 1-5 1985 : symposium proceedings : vol. 2
EditorsC.J. Timmermans
PublisherInternational Union of Pure and Applied Chemistry
Publication statusPublished - 1985


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