On the Deposition Mechanism of the Silica Like Films in Atmospheric Pressure Glow Discharge

S.A. Starostin, P.A. Premkumar, M. Creatore, Hinrik Vries, de, R.M.J. Paffen, M.C.M. Sanden, van de

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Abstract

Atmospheric pressure plasma enhanced thin film deposition (PECVD) is nowadays in focus of increasing scientific and industrial interest. The benefits of this newly emerging technology are in possibilities for cost-efficient in-line roll-to-roll production without expensive and cumbersome vacuum equipment. Yet, comparing to the well studied low pressure PECVD, there is a serious lack of insights on thin film deposition mechanisms on the moving substrates at high pressure. In this contribution we present a study of the deposition process of silica-like films in the diffuse high power variety of the dielectric barrier discharge referred as atmospheric pressure glow discharge (APGD) [1, 2]. This process is capable to produce uniform carbon-free silica-like films on the polymeric webs in low cost gas mixtures [2]. Considering deposition mechanisms in a roll-to-roll atmospheric PECVD reactor with a moving polymer substrate and gas flow, three different pathways which are simultaneously contributing to the film formation can be identified: a) ionic deposition, where ionized products of the decomposed precursor drift in the electric field towards the surface; b) diffusive deposition of neutral radicals produced in plasma and afterglow phases and c) deposition of large particles or dust. Due to the gas flow and depletion of the precursor, each of these mechanisms leads to layers characterized by a specific composition, morphology and location within the discharge area. In this contribution we will address the influence of the different mechanisms on film deposition, supported by space-resolved spectroscopic ellipsometry, XPS, SEM and water contact angle measurements. The experimental profiles of the deposition rate along the gas flow were analyzed with a 2D numerical convection-diffusion deposition model. [1] S. Okazaki, M. Kogoma, M. Uehara, Y. Kimura, J. Phys. D: Appl.Phys., 26, 889, (1993) [2] S.A. Starostin, M.A. ElSabbagh, E. Aldea, H. de Vries M. Creatore, M.C.M. van de Sanden, IEEE Trans. Plasma Sci. 36, 968 (2008) [3] S. Starostine, E. Aldea, H. de Vries, M. Creatore, M. C.M. van de Sanden, Plasma Process Polym, 4, S440 (2007)
Original languageEnglish
Title of host publicationProceedings of the 56th international American Vacuum Society Symposium & Exhibition (AVS 56) 8-13 November 2009, San Jose, California
Place of PublicationNew York, NY
PublisherAVS
PagesPS2-TuM5-56
Publication statusPublished - 2009
Eventconference; Plasma Science and Technology : Atmospheric Plasma Processing and Microplasmas -
Duration: 1 Jan 2009 → …

Conference

Conferenceconference; Plasma Science and Technology : Atmospheric Plasma Processing and Microplasmas
Period1/01/09 → …
OtherPlasma Science and Technology : Atmospheric Plasma Processing and Microplasmas

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