Abstract
The field in the entrance pupil of a high NA lens can be optimized such that, for given incident power, the electric field component in a given direction in the focal point is maximum. If the field component is chosen parallel to the optical axis, the longitudinal component is maximized and it is found that the optimum longitudinal component is narrower than the Airy spot. We discuss how this can be used to obtain higher resolution in photolithography when a resist is used that is sensitive to only the longitudinal component. We describe a proposition for realizing such resist.
| Original language | English |
|---|---|
| Pages (from-to) | 189-201 |
| Number of pages | 13 |
| Journal | Journal of Nonlinear Optical Physics & Materials |
| Volume | 19 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Mar 2010 |
Keywords
- High numerical aperture
- Longitudinal component
- Maximum field component in focus
- Polarization sensitive photoresist
- Vector diffraction