Abstract
We report for the first time an on-wafer propagation loss characterization technique that simplifies and speeds up the validation process. The small footprint (1.5 mm2) and high accuracy (±0.23 dB/cm) make this method ideal for PIC mass production.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the Integrated Photonics Research, Silicon and Nanophotonics. July 13-17, 2014, San Diego, California United States |
| Publisher | Optical Society of America (OSA) |
| Pages | IM3A.4.- |
| ISBN (Print) | 978-1-55752-737-0 |
| DOIs | |
| Publication status | Published - 2014 |
| Event | Integrated Photonics Research, Silicon and Nanophotonics, IPRSN 2014 - San Diego, CA, United States Duration: 13 Jul 2014 → 17 Jul 2014 |
Conference
| Conference | Integrated Photonics Research, Silicon and Nanophotonics, IPRSN 2014 |
|---|---|
| Abbreviated title | IPR '14 |
| Country/Territory | United States |
| City | San Diego, CA |
| Period | 13/07/14 → 17/07/14 |
Fingerprint
Dive into the research topics of 'Novel on-wafer technique for loss characterization'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver