A new, simplified method for preparing model surfaces of cellulose is introduced. Non-polar cellulose derivative trimethylsilyl cellulose (TMSC) was deposited onto untreated silicon substrate by spin coating, after which the coated TMSC was regenerated back to cellulose by vapour phase acid hydrolysis. By optimising the parameters of spin coating, a smooth cellulose film of ca 20 nm was obtained with roughness variation of max. 3 nm. With the well-defined morphology and chemical structure, combined with easy preparation, these model surfaces provide excellent means to explore the molecular level phenomena, taking place during various processes involving cellulose. Films were characterized using atomic force microscopy to illustrate the morphology and X-ray photoelectron spectroscopy to determine the chemical structure of the layers.