Novel damage model for delamination in Cu/low-k IC backend structures

M. A.J. Van Gils, O. Van Der Sluis, G. Q. Zhang, J. H.J. Janssen, R. M.J. Voncken

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

5 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Novel damage model for delamination in Cu/low-k IC backend structures'. Together they form a unique fingerprint.

Engineering