Non-hermetic cable connection to enable high voltage in low & medium vacuum: identification of critical cable interface

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Citations (Scopus)

Abstract

Higher actuator voltages are required for future generation lithography machines. The operating pressures, down to the medium pressure range, in combination with relevant distances can be situated near gas breakdown according to Paschen curves. Partial discharges may occur, making long-term damage conceivable. Characterization of the partial discharge inception voltage of a cable connection as function of pressure, will reveal limitations. An experimental method is proposed to recognize partial discharges originating from the critical cable interface and is applied for a RG58U cable. The result is characterized in terms of a widened and scaled Paschen curve.
Original languageEnglish
Title of host publication2016 IEEE Conference on Electrical Insulation and Dielectric Phenomena, 17-20 October 2016, Toronto, Ontario
Place of PublicationPiscataway
PublisherInstitute of Electrical and Electronics Engineers
Pages424-427
ISBN (Electronic)978-1-5090-4654-6
DOIs
Publication statusPublished - Oct 2016

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Partial discharges
Cables
Vacuum
Electric potential
Lithography
Actuators
Gases

Cite this

Driessen, A. B. J. M., van Duivenbode, J., & Wouters, P. A. A. F. (2016). Non-hermetic cable connection to enable high voltage in low & medium vacuum: identification of critical cable interface. In 2016 IEEE Conference on Electrical Insulation and Dielectric Phenomena, 17-20 October 2016, Toronto, Ontario (pp. 424-427). Piscataway: Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/CEIDP.2016.7785579
Driessen, A.B.J.M. ; van Duivenbode, J. ; Wouters, P.A.A.F. / Non-hermetic cable connection to enable high voltage in low & medium vacuum : identification of critical cable interface. 2016 IEEE Conference on Electrical Insulation and Dielectric Phenomena, 17-20 October 2016, Toronto, Ontario. Piscataway : Institute of Electrical and Electronics Engineers, 2016. pp. 424-427
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Driessen, ABJM, van Duivenbode, J & Wouters, PAAF 2016, Non-hermetic cable connection to enable high voltage in low & medium vacuum: identification of critical cable interface. in 2016 IEEE Conference on Electrical Insulation and Dielectric Phenomena, 17-20 October 2016, Toronto, Ontario. Institute of Electrical and Electronics Engineers, Piscataway, pp. 424-427. https://doi.org/10.1109/CEIDP.2016.7785579

Non-hermetic cable connection to enable high voltage in low & medium vacuum : identification of critical cable interface. / Driessen, A.B.J.M.; van Duivenbode, J.; Wouters, P.A.A.F.

2016 IEEE Conference on Electrical Insulation and Dielectric Phenomena, 17-20 October 2016, Toronto, Ontario. Piscataway : Institute of Electrical and Electronics Engineers, 2016. p. 424-427.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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AB - Higher actuator voltages are required for future generation lithography machines. The operating pressures, down to the medium pressure range, in combination with relevant distances can be situated near gas breakdown according to Paschen curves. Partial discharges may occur, making long-term damage conceivable. Characterization of the partial discharge inception voltage of a cable connection as function of pressure, will reveal limitations. An experimental method is proposed to recognize partial discharges originating from the critical cable interface and is applied for a RG58U cable. The result is characterized in terms of a widened and scaled Paschen curve.

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Driessen ABJM, van Duivenbode J, Wouters PAAF. Non-hermetic cable connection to enable high voltage in low & medium vacuum: identification of critical cable interface. In 2016 IEEE Conference on Electrical Insulation and Dielectric Phenomena, 17-20 October 2016, Toronto, Ontario. Piscataway: Institute of Electrical and Electronics Engineers. 2016. p. 424-427 https://doi.org/10.1109/CEIDP.2016.7785579