Non-critical waveguide alignment for vertically coupled microring using a mode-expanded bus architecture

C.W. Tee, K.A. Williams, R.V. Penty, I.H. White, M. Hamacher

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)
108 Downloads (Pure)

Abstract

Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient-only 6% for fabrication misalignments as high as 1 mum. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs
Original languageEnglish
Pages (from-to)2129-2131
Number of pages3
JournalIEEE Photonics Technology Letters
Volume18
Issue number20
DOIs
Publication statusPublished - 2006

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