Nickel-zinc ferrite films by rapid thermal processing of sol-gel precursors

R.E. van de Leest; F. Roozeboom

doi:10.1016/S0169-4332(01)00790-5

Nickel-zinc ferrite films by rapid thermal processing of sol-gel precursors

R.E. van de Leest, F. Roozeboom

Research output: Contribution to journal › Article › Academic › peer-review

12 Citations (Scopus)

Abstract

A photo-assisted, wet-chemical method (sol-gel) has been developed for the deposition and formation of soft-magnetic nickel-zinc ferrite films on thermally oxidized silicon substrates. A SiO₂-FeO_x buffer layer eases the thermal expansion mismatch between SiO₂ and the ferrite film and provides a nucleation base for the ferrite formation. Upon irradiation by a UV-lamp or rapid thermal processing, the Fe(III) species are reduced to Fe(II) species in the precursor film, which induces the formation of the ferrite film. Local ferrite deposition can be induced by selective UV-irradiation of the wet ferrite precursor film. The SiO₂-FeO_x buffer layer and the ferrite film have been characterized for their crystallinity and OH content which can be related to the magnetic and optical properties of these films.

Original language	English
Pages (from-to)	68-74
Number of pages	7
Journal	Applied Surface Science
Volume	187
Issue number	1-2
DOIs	https://doi.org/10.1016/S0169-4332(01)00790-5
Publication status	Published - 14 Feb 2002
Externally published	Yes

Keywords

Buffer layer
Ferrite
Film
Photo-induced curing
Rapid thermal processing
Sol-gel

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10.1016/S0169-4332(01)00790-5

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@article{674e7123458448419c5ed07097364712,

title = "Nickel-zinc ferrite films by rapid thermal processing of sol-gel precursors",

abstract = "A photo-assisted, wet-chemical method (sol-gel) has been developed for the deposition and formation of soft-magnetic nickel-zinc ferrite films on thermally oxidized silicon substrates. A SiO2-FeOx buffer layer eases the thermal expansion mismatch between SiO2 and the ferrite film and provides a nucleation base for the ferrite formation. Upon irradiation by a UV-lamp or rapid thermal processing, the Fe(III) species are reduced to Fe(II) species in the precursor film, which induces the formation of the ferrite film. Local ferrite deposition can be induced by selective UV-irradiation of the wet ferrite precursor film. The SiO2-FeOx buffer layer and the ferrite film have been characterized for their crystallinity and OH content which can be related to the magnetic and optical properties of these films.",

keywords = "Buffer layer, Ferrite, Film, Photo-induced curing, Rapid thermal processing, Sol-gel",

author = "{van de Leest}, R.E. and F. Roozeboom",

year = "2002",

month = feb,

day = "14",

doi = "10.1016/S0169-4332(01)00790-5",

language = "English",

volume = "187",

pages = "68--74",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - Nickel-zinc ferrite films by rapid thermal processing of sol-gel precursors

AU - van de Leest, R.E.

AU - Roozeboom, F.

PY - 2002/2/14

Y1 - 2002/2/14

N2 - A photo-assisted, wet-chemical method (sol-gel) has been developed for the deposition and formation of soft-magnetic nickel-zinc ferrite films on thermally oxidized silicon substrates. A SiO2-FeOx buffer layer eases the thermal expansion mismatch between SiO2 and the ferrite film and provides a nucleation base for the ferrite formation. Upon irradiation by a UV-lamp or rapid thermal processing, the Fe(III) species are reduced to Fe(II) species in the precursor film, which induces the formation of the ferrite film. Local ferrite deposition can be induced by selective UV-irradiation of the wet ferrite precursor film. The SiO2-FeOx buffer layer and the ferrite film have been characterized for their crystallinity and OH content which can be related to the magnetic and optical properties of these films.

AB - A photo-assisted, wet-chemical method (sol-gel) has been developed for the deposition and formation of soft-magnetic nickel-zinc ferrite films on thermally oxidized silicon substrates. A SiO2-FeOx buffer layer eases the thermal expansion mismatch between SiO2 and the ferrite film and provides a nucleation base for the ferrite formation. Upon irradiation by a UV-lamp or rapid thermal processing, the Fe(III) species are reduced to Fe(II) species in the precursor film, which induces the formation of the ferrite film. Local ferrite deposition can be induced by selective UV-irradiation of the wet ferrite precursor film. The SiO2-FeOx buffer layer and the ferrite film have been characterized for their crystallinity and OH content which can be related to the magnetic and optical properties of these films.

KW - Buffer layer

KW - Ferrite

KW - Film

KW - Photo-induced curing

KW - Rapid thermal processing

KW - Sol-gel

UR - http://www.scopus.com/inward/record.url?scp=0037075253&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(01)00790-5

DO - 10.1016/S0169-4332(01)00790-5

M3 - Article

AN - SCOPUS:0037075253

SN - 0169-4332

VL - 187

SP - 68

EP - 74

JO - Applied Surface Science

JF - Applied Surface Science

IS - 1-2

ER -

Nickel-zinc ferrite films by rapid thermal processing of sol-gel precursors

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Keywords

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